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Suss MicroTec MA8/BA8 Mask Aligner Gen3
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190,000.00
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FSI Polaris 2500 Microlithography Cluster 200mm capable of 193nm to 750nm processing
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150,000.00
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Applied Materials E MAX chamber 8inch notch type
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53,000.00
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TEL TE 8500 Dry Etcher
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0.00
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Akrion Gama Wafer Cleaner
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KLA KLA5200
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TEL ACT 12
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RORZE RR700L150-Z30-010
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AMAT VHP, VHP+ and XP Robots
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DNS 80BW
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OnTrak DSS-200 Series 2
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TEL Clean Track ACT 12 2C4D 8 inch DUV Coater Developer JCT702
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TEL (Tokyo Electron) Telius SP-305 SCCM Dialectric Etch
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lp teos
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LAM EXELAN Dual Frequency 27/2 MHz Etch Tool with Plasma Monitoring
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