Carl Zeiss PROVE Compact Photomask Registration & Overlay Metrology System

Carl Zeiss PROVE Compact Photomask Registration & Overlay Metrology System

Wafer Size: 300mm

HDD Not Included

Factory interface (FI) with 1 loadport for SMIF pod RSP-200. Separate electronic cabinets reduce the main tool’s footprint and isolate heat-generating sources, and a separate pre-climatization unit supplies conditioned air for main chamber environmental control. Operator desk has dual monitors for simultaneous viewing of the tool PC and station controller.

Transfer chamber features a 6-axis external handling robot moving masks from loadport to library to internal handling systems, plus an internal handling robot that interfaces with a fine alignment station for accurate mask edge detection. The mask library holds up to 10 masks within the tool at any time.

Process chamber is temperature- and humidity-controlled with an ultra-precision stage for measuring masks in the face-up position. The stage rests on advanced damping devices for optimal registration repeatability.

Imaging optics: 193 nm excimer source with a 25 µm field of view, capable of registration measurements in both reflection and transmission mode, and through-pellicle measurements for optical masks. Red VIS camera for coarse alignment and mask position measurements. Measurement speed is 600 sites per hour with 5 plane measurements and up to 1000 sites per hour with 1 plane measurement.

Performance (reflection and transmission modes): long-term registration repeatability < 0.55 nm with first-order corrections and < 0.8 nm with 0th-order corrections; registration accuracy < 0.95 nm; screen linearity < 1 nm; centrality repeatability < 10 µm.

Available November 2026